Principle and process of etching

Etching is a technique that uses chemical reaction or physical impact to remove materials. Etching techniques can be divided into wet etching and dry etching.

It was first used to manufacture copper plate, zinc plate and other printing embossing plates, and also widely used in the processing of weight reduction instrument panels, nameplates and thin workpieces that are difficult to process by traditional processing methods; after continuous improvement and process equipment Development can also be used in the processing of precision etching products for electronic thin parts in the aviation, mechanical, and chemical industries. Especially in the semiconductor manufacturing process, etching is an indispensable technology.

Principles of etching

Generally referred to as etching is also called photochemical etching, which refers to the removal of the protective film of the area to be etched after exposure to plate making and development, and contact with chemical solutions during etching to achieve the effect of dissolving and corroding, forming unevenness or hollowing out.

Process flow

Exposure method: The project prepares the size of the material according to the graph-material preparation-material cleaning-drying → film or coating → drying → exposure → development → drying-etching → stripping → OK

Screen printing method: cutting → cleaning the plate (stainless steel and other metal materials) → screen printing → etching → stripping → OK

Etching excellent version: The anti-corrosion ink is printed on the surface of the material using inkjet printing technology, and then cured (usually with light curing or thermal curing) to obtain the anti-corrosion layer and then proceed to the next step of chemical corrosion or electric corrosion.

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